Invention Grant
- Patent Title: EUV pellicles
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Application No.: US16758250Application Date: 2018-11-06
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Publication No.: US11237475B2Publication Date: 2022-02-01
- Inventor: Zomer Silvester Houweling , Chaitanya Krishna Ande , Dennis De Graaf , Thijs Kater , Michael Alfred Josephus Kuijken , Mahdiar Valefi
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP17201126 20171110,EP18165122 20180329
- International Application: PCT/EP2018/080219 WO 20181106
- International Announcement: WO2019/091932 WO 20190516
- Main IPC: G03F1/62
- IPC: G03F1/62

Abstract:
A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.
Public/Granted literature
- US20200341365A1 EUV PELLICLES Public/Granted day:2020-10-29
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