Invention Grant
- Patent Title: Gas sensing device and gas concentration sensing method
-
Application No.: US16879340Application Date: 2020-05-20
-
Publication No.: US11243198B2Publication Date: 2022-02-08
- Inventor: Yu-Ying Lin , Ying-Che Lo , Chung-Yi Hsu , Po-Jen Su
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Priority: TW108147004 20191220
- Main IPC: G01N33/00
- IPC: G01N33/00 ; G01N27/12

Abstract:
A gas sensing device is adapted to detect a concentration of a target gas. The gas sensing device comprises a dielectric layer, a reference sensing portion, a target sensing portion, and a controller. The dielectric layer is disposed on a surface. The reference sensing portion and the target sensing portion are respectively disposed on a supporting side of the dielectric layer, with said supporting side facing away from the surface. The reference sensing portion includes a first conductive layer and a first sensing layer with low sensitivity to the target gas. The target sensing portion includes a second conductive layer and a second sensing layer with high sensitivity to the target gas. The controller obtains the immittance values of the first conductive layer and the second conductive layer, and calculates a concentration value of the target gas according to the immittance values and a correlation function.
Public/Granted literature
- US20210190744A1 GAS SENSING DEVICE AND GAS CONCENTRATION SENSING METHOD Public/Granted day:2021-06-24
Information query