Invention Grant
- Patent Title: RRAM structure with only part of variable resistive layer covering bottom electrode and method of fabricating the same
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Application No.: US16794194Application Date: 2020-02-18
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Publication No.: US11257864B2Publication Date: 2022-02-22
- Inventor: Wen-Jen Wang , Chun-Hung Cheng , Chuan-Fu Wang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: CN202010035925.5 20200114
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L27/24 ; H01L45/00

Abstract:
An RRAM structure includes a substrate. The substrate is divided into a memory cell region and a logic device region. A metal plug is disposed within the memory cell region. An RRAM is disposed on and contacts the metal plug. The RRAM includes a top electrode, a variable resistive layer, and a bottom electrode. The variable resistive layer is disposed between the top electrode and the bottom electrode. The variable resistive layer includes a first bottom surface. The bottom electrode includes a first top surface. The first bottom surface and the first top surface are coplanar. The first bottom surface only overlaps and contacts part of the first top surface.
Public/Granted literature
- US20210217813A1 RRAM STRUCTURE AND METHOD OF FABRICATING THE SAME Public/Granted day:2021-07-15
Information query
IPC分类: