Invention Grant
- Patent Title: Block copolymer and method of producing the same, and method of producing structure containing phase-separated structure
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Application No.: US16286232Application Date: 2019-02-26
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Publication No.: US11261299B2Publication Date: 2022-03-01
- Inventor: Akiyoshi Yamazaki , Daisuke Kawana , Takehiro Seshimo , Teruaki Hayakawa , Lei Dong , Rin Odashima
- Applicant: TOKYO OHKA KOGYO CO., LTD. , TOKYO INSTITUTE OF TECHNOLOGY
- Applicant Address: JP Kawasaki; JP Tokyo
- Assignee: TOKYO OHKA KOGYO CO., LTD.,TOKYO INSTITUTE OF TECHNOLOGY
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.,TOKYO INSTITUTE OF TECHNOLOGY
- Current Assignee Address: JP Kawasaki; JP Tokyo
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JPJP2018-039127 20180305
- Main IPC: C08F283/12
- IPC: C08F283/12 ; C08G77/04 ; G03F7/20 ; C08G77/442 ; C08G77/26 ; C08G77/28
Abstract:
A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure represented by general formula (u2-1), and a block (b22) consisting of a polymer having a repeating structure of a structural unit (u22) containing a silicon atom, and the block (b22) is positioned between the first block and the block (b21) (wherein RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 represents an organic group having a polar group).
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