Invention Grant
- Patent Title: Copper interconnect cladding
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Application No.: US15937527Application Date: 2018-03-27
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Publication No.: US11270943B2Publication Date: 2022-03-08
- Inventor: Flavio Griggio , Philip Yashar , Anthony V. Mule , Gopinath Trichy , Gokul Malyavanatham
- Applicant: INTEL CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: INTEL CORPORATION
- Current Assignee: INTEL CORPORATION
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L21/768 ; H01L21/02 ; H01L23/522 ; H01L23/528 ; H01L27/02

Abstract:
An integrated circuit includes: a front end of line (FEOL) circuit including a transistor; and a back end of line circuit above the FEOL circuit and including insulator material having an interconnect feature therein. The interconnect feature includes: a core including copper; a first layer between the insulator material and the core, the first layer being distinct from the core; a second layer between the first layer and the core, the second layer being distinct from the first layer and the core, the second layer including a first metal and a second metal different from the first metal; and a capping member on the core and the second layer, the capping member including the second metal. In an embodiment, the first metal and the second metal are part of a solid solution in the second layer. In an embodiment, the first metal is ruthenium and the second metal is cobalt.
Public/Granted literature
- US20190304918A1 COPPER INTERCONNECT CLADDING Public/Granted day:2019-10-03
Information query
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