Invention Grant
- Patent Title: Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask
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Application No.: US17019238Application Date: 2020-09-12
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Publication No.: US11294275B2Publication Date: 2022-04-05
- Inventor: Tzu Han Liu , Chih-Wei Wen , Chung-Hung Lin
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F1/38
Abstract:
The present disclosure provides an apparatus for mounting a pellicle to a photomask, including a presser, a pellicle stage facing the presser, and a flexible material layer between the presser and the pellicle stage, wherein the flexible material layer includes a compartment filled with gas.
Information query
