Invention Grant
- Patent Title: Method and system for optically inspecting a substrate
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Application No.: US16959930Application Date: 2018-12-27
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Publication No.: US11300520B2Publication Date: 2022-04-12
- Inventor: Mayeul Durand De Gevigney
- Applicant: UNITY SEMICONDUCTOR
- Applicant Address: FR Montbonnot-Saint-Martin
- Assignee: UNITY SEMICONDUCTOR
- Current Assignee: UNITY SEMICONDUCTOR
- Current Assignee Address: FR Montbonnot-Saint-Martin
- Agency: Greer, Burns & Crain, Ltd
- Priority: FR1850077 20180105
- International Application: PCT/EP2018/097014 WO 20181227
- International Announcement: WO2019/134887 WO 20190711
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01N21/95

Abstract:
A method and related system for substrate inspection, includes: creating, based on two light beams originating from one light source, a measurement volume at the intersection between the two light beams, the measurement volume containing interference fringes and being positioned to extend into the substrate, the substrate moving relative to the measurement volume in a direction parallel to a main surface S of the substrate; acquiring a measurement signal representative of the light scattered by the substrate, as a function of the location of the measurement volume on the substrate; calculating at least one expected modulation frequency, of an expected signal representative of the passage of a defect of the substrate through the measurement volume; determining values representative of a frequency content of the measurement signal close to the modulation frequency, to constitute a validated signal representative of the presence of defects; and analyzing the signal to locate and/or identify defects.
Public/Granted literature
- US20210215617A1 METHOD AND SYSTEM FOR OPTICALLY INSPECTING A SUBSTRATE Public/Granted day:2021-07-15
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