Invention Grant
- Patent Title: Instant tuning method for accelerating resist and etch model calibration
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Application No.: US16977137Application Date: 2019-03-07
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Publication No.: US11314172B2Publication Date: 2022-04-26
- Inventor: Hongfei Shi , Jinze Wang , Pengcheng Yang , Lei Wang , Mu Feng
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2019/055691 WO 20190307
- International Announcement: WO2019/179782 WO 20190926
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method for accelerating calibration of a fabrication process model, the method including performing one or more iterations of: defining one or more fabrication process model terms; receiving predetermined information related to the one or more fabrication process model terms; generating a fabrication process model based on the predetermined information, the fabrication process model configured to generate one or more predictions related to a metrology gauge; determining whether a prediction related to a dimension of a gauge is within a predetermined threshold of the gauge as measured on a post-fabrication process substrate; and responsive to the prediction not breaching the predetermined threshold, optimizing the one or more fabrication process terms such that the prediction related to the dimension of the gauge is within the predetermined threshold of the gauge as measured on the post-fabrication process substrate.
Public/Granted literature
- US20210048751A1 INSTANT TUNING METHOD FOR ACCELERATING RESIST AND ETCH MODEL CALIBRATION Public/Granted day:2021-02-18
Information query
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