Invention Grant
- Patent Title: Electron source regeneration method
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Application No.: US16966911Application Date: 2018-12-27
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Publication No.: US11315748B2Publication Date: 2022-04-26
- Inventor: Xuehui Wang , Zhao Huang , Junting Wang , Tingting Luo , Huarong Liu , Xingjia Yao , Yijing Li , Lei Zheng , Chunning Zheng
- Applicant: 38th Research Institute, China Electronics Technology Group Corporation
- Applicant Address: CN Anhui
- Assignee: 38th Research Institute, China Electronics Technology Group Corporation
- Current Assignee: 38th Research Institute, China Electronics Technology Group Corporation
- Current Assignee Address: CN Anhui
- Agency: Myers Bigel, P.A.
- Priority: CN201811190762.7 20181012
- International Application: PCT/CN2018/124354 WO 20181227
- International Announcement: WO2020/073514 WO 20200416
- Main IPC: H01J9/50
- IPC: H01J9/50 ; H01J1/304
Abstract:
The present disclosure provides a method of regenerating an electron source, the electron source including at least one emission site fixed on a needle tip, and the emission site including a reaction product formed by metal atoms and gas molecules. The method includes regenerating the electron source in situ if an emission capability of the electron source satisfies a regeneration condition.
Public/Granted literature
- US20210050173A1 ELECTRON SOURCE REGENERATION METHOD Public/Granted day:2021-02-18
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