Invention Grant
- Patent Title: Two-stage bake photoresist with releasable quencher
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Application No.: US16075555Application Date: 2016-04-08
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Publication No.: US11315798B2Publication Date: 2022-04-26
- Inventor: Robert L. Bristol , Marie Krysak , James M. Blackwell , Florian Gstrein , Kent N. Frasure
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- International Application: PCT/US2016/026599 WO 20160408
- International Announcement: WO2017/176282 WO 20171012
- Main IPC: G03F7/039
- IPC: G03F7/039 ; H01L21/311 ; G03F7/004 ; G03F7/20 ; G03F7/38 ; H01L21/027 ; H01L21/033 ; H01L21/768
Abstract:
Two-stage bake photoresists with releasable quenchers for fabricating back end of line (BEOL) interconnects are described. In an example, a photolyzable composition includes an acid-deprotectable photoresist material having substantial transparency at a wavelength, a photo-acid-generating (PAG) component having substantial transparency at the wavelength, and a base-generating component having substantial absorptivity at the wavelength.
Public/Granted literature
- US20190043731A1 TWO-STAGE BAKE PHOTORESIST WITH RELEASABLE QUENCHER Public/Granted day:2019-02-07
Information query
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