An object of the present invention is to provide a film forming method capable of forming a film by an aerosol deposition with high accuracy patterning. The object of the present invention is achieved by aerosolizing a raw material liquid including a film forming material; supplying the aerosol to a base material; and forming a film of the film forming material on the base material, in which the base material has, on a film forming surface, a liquid-repellent region which has liquid repellency to the raw material liquid and a lyophilic region which has lyophilicity to the raw material liquid, and in a case where a width of the liquid-repellent region is L and a diameter of the aerosol is D, “D>L” is satisfied.