Invention Grant
- Patent Title: Photo-curable composition and patterning method using the same
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Application No.: US16719647Application Date: 2019-12-18
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Publication No.: US11332597B2Publication Date: 2022-05-17
- Inventor: Toshiki Ito , Chieko Mihara , Kanae Kawahata , Motoki Okinaka , Youji Kawasaki
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2011-246714 20111110
- Main IPC: C08K5/06
- IPC: C08K5/06 ; H05K3/00 ; B05D3/12 ; B05D3/06 ; G03F7/031 ; G03F7/038 ; B82Y10/00 ; B82Y40/00 ; G03F7/004 ; G03F7/00 ; G03F7/027 ; C08F2/24 ; C08F2/48
Abstract:
The present invention provides a photo-curable composition, and UV imprint method, that requires a small demolding force, wherein the photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C), and the photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
Information query
