- Patent Title: Substrate integrated inductor with composite magnetic resin layer
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Application No.: US16498775Application Date: 2017-04-28
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Publication No.: US11335616B2Publication Date: 2022-05-17
- Inventor: Malavarayan Sankarasubramanian , Yongki Min , Ashay A. Dani , Kaladhar Radhakrishnan
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- International Application: PCT/US2017/030182 WO 20170428
- International Announcement: WO2018/199990 WO 20181101
- Main IPC: H01L23/31
- IPC: H01L23/31 ; H01L23/498 ; H01L23/522

Abstract:
A semiconductor package may include a composite magnetic inductor that is formed integral with the semiconductor substrate. The composite magnetic inductor may include a composite magnetic resin layer and a plurality of conductive layers arranged such that the composite magnetic resin layer is interleaved between successive conductive layers. The resultant composite magnetic inductor may be disposed between dielectric layers. A core layer may be disposed proximate the composite magnetic inductor. A build-up layer may be disposed proximate the core layer or proximate the composite magnetic inductor in a coreless semiconductor substrate. A semiconductor die may couple to the build-up layer. The composite magnetic inductor beneficially provides a greater inductance than external inductors coupled to the semiconductor package.
Public/Granted literature
- US20210098326A1 SUBSTRATE INTEGRATED INDUCTOR Public/Granted day:2021-04-01
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