Invention Grant
- Patent Title: Resin composition for forming varistor and varistor
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Application No.: US16770699Application Date: 2018-12-04
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Publication No.: US11339269B2Publication Date: 2022-05-24
- Inventor: Yoshitaka Kamata
- Applicant: NAMICS CORPORATION
- Applicant Address: JP Niigata
- Assignee: NAMICS CORPORATION
- Current Assignee: NAMICS CORPORATION
- Current Assignee Address: JP Niigata
- Agency: Holtz, Holtz & Volek PC
- Priority: JPJP2017-237661 20171212
- International Application: PCT/JP2018/044467 WO 20181204
- International Announcement: WO2019/116955 WO 20190620
- Main IPC: C08K3/04
- IPC: C08K3/04 ; C08K5/09 ; C08L63/00 ; H01C7/10

Abstract:
Provided are a resin composition for forming a varistor and a varistor capable of increasing freedom in the design of substrates, ICs, or electronics. The resin composition for forming a varistor includes (A) an epoxy resin, (B) a curing agent, (C) carbon nanotubes, and (D) a dispersant. The (C) carbon nanotubes may be single-walled carbon nanotubes, multi-walled carbon nanotubes, or a combination thereof. The (D) dispersant includes a polyalkyl oxide surfactant. The polyalkyl oxide surfactant has a polyalkyl ether skeleton in the molecule.
Public/Granted literature
- US20210155769A1 RESIN COMPOSITION FOR FORMING VARISTOR AND VARISTOR Public/Granted day:2021-05-27
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