Invention Grant
- Patent Title: Electrostatic chuck device
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Application No.: US16958094Application Date: 2018-12-11
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Publication No.: US11348819B2Publication Date: 2022-05-31
- Inventor: Yuuki Kinpara , Ryuuji Hayahara , Kazunori Ishimura , Hitoshi Kouno
- Applicant: SUMITOMO OSAKA CEMENT CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Merchant & Gould P.C.
- Priority: JPJP2017-253791 20171228
- International Application: PCT/JP2018/045504 WO 20181211
- International Announcement: WO2019/131115 WO 20190704
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67 ; H01L21/687 ; H02N13/00

Abstract:
An electrostatic chuck device includes: an electrostatic chuck part having, as a main surface, a mounting surface on which a plate-shaped sample is mounted, an electrostatic attraction electrode; a base part configured to cool the electrostatic chuck part; a heater disposed in a layered manner between the electrostatic chuck part and the base part; and an adhesion layer which bonds and integrates the electrostatic chuck part and the base part together, in which the electrostatic chuck part is provided with a first through-hole, the base part is provided with a second through-hole communicating with the first through-hole, the adhesion layer is provided with a third through-hole communicating with the first through-hole and the second through-hole, a tubular insulator is fixed in the second through-hole, and an end of the insulator located on the electrostatic chuck part side is separated from the electrostatic chuck part with a space interposed therebetween.
Public/Granted literature
- US20200343125A1 ELECTROSTATIC CHUCK DEVICE Public/Granted day:2020-10-29
Information query
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