Invention Grant
- Patent Title: Group III-nitride polarization junction diodes
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Application No.: US16644130Application Date: 2017-09-29
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Publication No.: US11355652B2Publication Date: 2022-06-07
- Inventor: Han Wui Then , Marko Radosavljevic , Sansaptak Dasgupta
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Essential Patents Group, LLP
- International Application: PCT/US2017/054358 WO 20170929
- International Announcement: WO2019/066908 WO 20190404
- Main IPC: H01L29/88
- IPC: H01L29/88 ; H01L27/02 ; H01L29/06 ; H01L29/20 ; H01L29/205 ; H01L29/66

Abstract:
Diodes employing one or more Group III-Nitride polarization junctions. A III-N polarization junction may include two III-N material layers having opposite crystal polarities. The opposing polarities may induce a two-dimensional charge sheet (e.g., 2D electron gas) within each of the two III-N material layers. Opposing crystal polarities may be induced through introduction of an intervening layer between two III-N material layers. The intervening layer may be of a material other than a Group III-Nitride. Where a P-i-N diode structure includes two Group III-Nitride polarization junctions, opposing crystal polarities at a first of such junctions may induce a 2D electron gas (2DEG), while opposing crystal polarities at a second of such junctions may induce a 2D hole gas (2DHG). Diode terminals may then couple to each of the 2DEG and 2DHG.
Public/Granted literature
- US20210005759A1 GROUP III-NITRIDE POLARIZATION JUNCTION DIODES Public/Granted day:2021-01-07
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