Invention Grant
- Patent Title: Measurement system and method for setting observation conditions of measurement apparatus
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Application No.: US17279039Application Date: 2019-08-09
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Publication No.: US11380518B2Publication Date: 2022-07-05
- Inventor: Takafumi Miwa , Hirokazu Tamaki , Momoyo Enyama , Makoto Sakakibara , Sayaka Kurata , Atsuko Shintani , Takashi Dobashi , Kotoko Urano , Akiko Kagatsume , Minseok Park , Yasuhiro Shirasaki , Thantip Krasienapibal
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JPJP2018-192172 20181010
- International Application: PCT/JP2019/031734 WO 20190809
- International Announcement: WO2020/075381 WO 20200416
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/22 ; H01J37/28

Abstract:
A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.
Public/Granted literature
- US20210407763A1 Measurement System and Method for Setting Observation Conditions of Measurement Apparatus Public/Granted day:2021-12-30
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