Invention Grant
- Patent Title: Substrate analysis method and substrate analyzer
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Application No.: US17415191Application Date: 2019-11-06
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Publication No.: US11422071B2Publication Date: 2022-08-23
- Inventor: Katsuhiko Kawabata , Sungjae Lee , Takuma Hayashi
- Applicant: IAS, INC.
- Applicant Address: JP Tokyo
- Assignee: IAS, INC.
- Current Assignee: IAS, INC.
- Current Assignee Address: JP Tokyo
- Agency: Roberts & Roberts, LLP
- Priority: JPJP2018-242929 20181226
- International Application: PCT/JP2019/043353 WO 20191106
- International Announcement: WO2020/137173 WO 20200702
- Main IPC: G01N1/28
- IPC: G01N1/28 ; G01N19/08 ; G01N1/10

Abstract:
A substrate analysis method using a nozzle for substrate analysis which discharges an analysis liquid from a tip thereof, scans a substrate surface with a discharged analysis liquid, and sucks the analysis liquid. This is done by arranging a liquid catch plate that catches the discharged analysis liquid, thus retaining analysis liquid discharged between the nozzle tip and the liquid catch plate; positioning the substrate so that the end part thereof can be inserted between the nozzle tip and the liquid catch plate; bringing the end part of the substrate into contact with analysis liquid retained between the nozzle tip and liquid catch plate; and moving the nozzle and liquid catch plate concurrently along a periphery of the substrate, while keeping the end part of the substrate in contact with the analysis liquid, to analyze the end part of the substrate.
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