Invention Grant
- Patent Title: Method and system for large silicon photonic interposers by stitching
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Application No.: US17107458Application Date: 2020-11-30
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Publication No.: US11424837B2Publication Date: 2022-08-23
- Inventor: Peter De Dobbelaere , Attila Mekis , Gianlorenzo Masini
- Applicant: LUXTERA LLC
- Applicant Address: US DE Wilmington
- Assignee: LUXTERA LLC
- Current Assignee: LUXTERA LLC
- Current Assignee Address: US DE Wilmington
- Agency: Patterson + Sherdan, LLP
- Main IPC: H04B10/80
- IPC: H04B10/80 ; G02B6/42 ; G02B6/122 ; G02B6/34 ; G02B6/43 ; H01R13/6461 ; H01R13/6471 ; H01R13/6588 ; H01R24/60 ; H01R25/00 ; H01R13/6585 ; H01R13/6586 ; H01R13/6594 ; H01R107/00

Abstract:
Methods and systems for large silicon photonic interposers by stitching are disclosed and may include, in an optical communication system including a silicon photonic interposer, where the interposer includes a plurality of reticle sections: communicating an optical signal between first and second reticle sections utilizing a waveguide. The waveguide may include a taper region at a boundary between the two reticle sections, the taper region expanding an optical mode of the communicated optical signal prior to the boundary and narrowing the optical mode after the boundary. A continuous wave (CW) optical signal may be received in a first of the reticle sections from an optical source external to the interposer. The CW optical signal may be received in the interposer from an optical source assembly coupled to a grating coupler in the first of the reticle sections in the silicon photonic interposer.
Public/Granted literature
- US20210175979A1 METHOD AND SYSTEM FOR LARGE SILICON PHOTONIC INTERPOSERS BY STITCHING Public/Granted day:2021-06-10
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