Invention Grant
- Patent Title: Photocurable composition for forming cured layers with high thermal stability
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Application No.: US17122056Application Date: 2020-12-15
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Publication No.: US11434312B2Publication Date: 2022-09-06
- Inventor: Fen Wan , Weijun Liu , Fei Li , Timothy Brian Stachowiak
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Abel Schillinger, LLP
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/50 ; C08G61/04 ; C08F212/08 ; B05D3/06 ; C08F222/10 ; B32B27/26 ; B32B27/30

Abstract:
A photocurable composition can comprise a polymerizable material and a photo-initiator, wherein the polymerizable material can comprise at least one multi-functional vinylbenzene in an amount of 15 wt % to 85 wt % and at least one multi-functional acrylate monomer in an amount of 15 wt % to 85 wt % based on the total weight of the photocurable composition. A photo-cured layer of the photocurable composition can have a high heat stability up to 400° C. and a glass transition temperature of at least 135° C.
Public/Granted literature
- US20220185914A1 PHOTOCURABLE COMPOSITION FOR FORMING CURED LAYERS WITH HIGH THERMAL STABILITY Public/Granted day:2022-06-16
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