Invention Grant
- Patent Title: Method of determining a set of metrology points on a substrate, associated apparatus and computer program
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Application No.: US17440251Application Date: 2020-03-19
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Publication No.: US11435673B2Publication Date: 2022-09-06
- Inventor: Kevin Van De Ruit , Roy Werkman , Jochem Sebastiaan Wildenberg
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP19164831 20190325,EP19170764 20190424
- International Application: PCT/EP2020/057617 WO 20200319
- International Announcement: WO2020/193367 WO 20201001
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20
Abstract:
A method of determining a set of metrology point locations, the set including a subset of potential metrology point locations on a substrate, the method including: determining a relation between noise distributions associated with a plurality of the potential metrology point locations using existing knowledge; and using the determined relation and a model associated with the substrate to determine the set.
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