Invention Grant
- Patent Title: Semiconductor device and a method of manufacturing thereof
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Application No.: US17163746Application Date: 2021-02-01
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Publication No.: US11450639B2Publication Date: 2022-09-20
- Inventor: Shih-An Liao , Shau-Yi Chen , Ming-Chi Hsu , Chun-Hung Liu , Min-Hsun Hsieh
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Marquez IP Law Office PLLC
- Agent Juan Carlos A. Marquez
- Priority: TW105107908 20160315
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/00 ; H01L33/62 ; H01L33/30 ; H01L33/64

Abstract:
A semiconductor device comprises a semiconductor die, comprising a stacking structure, a first bonding pad with a first bonding surface positioned away from the stack structure, and a second bonding pad; a carrier comprising a connecting surface; a third bonding pad which comprises a second bonding surface and is arranged on the connecting surface, and a fourth bonding pad arranged on the connecting surface of the carrier; and a conductive connecting layer comprising a first conductive part, comprising a first outer contour, and formed between and directly contacting the first bonding pad and the third bonding pad; a second conductive part formed between the second bonding pad and the fourth bonding pad; and a blocking part covering the first conductive part to form a covering area, wherein the first bonding surface comprises a first position which is the closest to the carrier within the covering area and a second position which is the farthest from the carrier within the covering area in a cross section view, and a distance from the first position to the first out contour is greater than that from the second position to the first outer contour.
Public/Granted literature
- US20210151405A1 SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THEREOF Public/Granted day:2021-05-20
Information query
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