Invention Grant
- Patent Title: EUV chamber apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method
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Application No.: US16894504Application Date: 2020-06-05
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Publication No.: US11452196B2Publication Date: 2022-09-20
- Inventor: Kouichiro Kouge , Yusuke Hoshino , Toshihiro Nishisaka , Takashi Okada
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JPJP2019-136640 20190725
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20
Abstract:
An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.
Public/Granted literature
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