Invention Grant
- Patent Title: Positioning system and a method for positioning a substage or a stage with respect to a frame
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Application No.: US16763925Application Date: 2018-10-18
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Publication No.: US11460786B2Publication Date: 2022-10-04
- Inventor: Yang-Shan Huang , Petrus Theodorus Rutgers
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP17201865 20171115
- International Application: PCT/EP2018/078579 WO 20181018
- International Announcement: WO2019/096536 WO 20190523
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H02K21/44 ; H02K41/03

Abstract:
A method for positioning a substage (9), supported by a main stage (5), relative to a reference object, the substage moveable in a direction (7) between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems (119, 121), each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.
Public/Granted literature
- US20210373446A1 A Positioning System and a Method for Positioning a Substage or a Stage with Respect to a Frame Public/Granted day:2021-12-02
Information query
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