Invention Grant
- Patent Title: Laser apparatus for generating extreme ultraviolet light
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Application No.: US16665335Application Date: 2019-10-28
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Publication No.: US11477877B2Publication Date: 2022-10-18
- Inventor: Hitoshi Nagano , Yasunori Wada , Tatsuya Yanagida , Osamu Wakabayashi
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP2011-220911 20111005,JP2012-135472 20120615
- Main IPC: H05G2/00
- IPC: H05G2/00 ; H01S3/107 ; G03F7/20 ; H01S3/23 ; H01S3/00 ; H01S3/10 ; G21K1/06 ; H01L21/027 ; H01S3/13 ; H01S3/16 ; H01S5/40 ; H01S3/115

Abstract:
A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.
Public/Granted literature
- US20200068695A1 LASER APPARATUS FOR GENERATING EXTREME ULTRAVIOLET LIGHT Public/Granted day:2020-02-27
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