- Patent Title: Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate
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Application No.: US16818003Application Date: 2020-03-13
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Publication No.: US11492432B2Publication Date: 2022-11-08
- Inventor: Hiroshi Yabu , Yuta Saito
- Applicant: Japan Science and Technology Agency
- Applicant Address: JP Kawaguchi
- Assignee: Japan Science and Technology Agency
- Current Assignee: Japan Science and Technology Agency
- Current Assignee Address: JP Kawaguchi
- Agency: Amster, Rothstein & Ebenstein LLP
- Priority: JP2012-266628 20121205
- Main IPC: C08F220/54
- IPC: C08F220/54 ; B32B27/00 ; G03F7/00 ; C09D133/24 ; B32B27/08 ; B32B27/30 ; B29C59/00 ; B29C59/02 ; C08F220/70 ; B29K33/00

Abstract:
Provided is a resin for nanoimprinting, which is capable of preventing removal of a transfer-receiving resin from a substrate when a mold is separated during nanoimprinting, and which is also capable of transferring a pattern on a mold to a transfer-receiving resin with high accuracy during thermal nanoimprinting, while improving the throughput. A resin for nanoimprinting, which is represented by formula (1). (In the formula, each of R1-R5 independently represents —H or —OH, and at least one of the R1-R5 moieties represents —OH; R6 represents a linear, branched or cyclic alkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms or an aralkyl group having 7-20 carbon atoms; X represents an amide or an ester; Y may be absent, or represents an amide or an ester; P represents an integer of 1-10; and each of m and n represents an integer of 1 or more.)
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