- Patent Title: Valve device, adjustment information generating method, flow rate adjusting method, fluid control system, flow rate control method, semiconductor manufacturing system and semiconductor manufacturing method
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Application No.: US16647569Application Date: 2018-09-11
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Publication No.: US11512993B2Publication Date: 2022-11-29
- Inventor: Kenta Kondo , Toshihide Yoshida , Hidenobu Sato , Tomohiro Nakata , Tsutomu Shinohara , Masahiko Takimoto
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JPJP2017-183556 20170925
- International Application: PCT/JP2018/033583 WO 20180911
- International Announcement: WO2019/059040 WO 20190328
- Main IPC: G01F15/00
- IPC: G01F15/00 ; F16K31/00 ; G01F11/00 ; G01F15/06 ; H01L21/02 ; F16K31/04 ; F16K31/122 ; F16K31/48
Abstract:
A valve device is capable of precisely adjusting a flow rate variation with time, aging, or the like without using an external sensor or using as few external sensors as possible. The apparatus includes an adjusting actuator for adjusting the position of the operating member positioned at the open position, a communication unit for receiving adjustment information relating to the adjustment of the opening degree of the flow path by the valve element from the outside of the apparatus, and a control unit for adjusting the position of the operating member by driving the adjusting actuator based on the adjustment information.
Public/Granted literature
Information query
