• Patent Title: Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method
  • Application No.: US17109443
    Application Date: 2020-12-02
  • Publication No.: US11520242B2
    Publication Date: 2022-12-06
  • Inventor: Yasuo Aoki
  • Applicant: NIKON CORPORATION
  • Applicant Address: JP Tokyo
  • Assignee: NIKON CORPORATION
  • Current Assignee: NIKON CORPORATION
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff PLC
  • Priority: JPJP2016-194413 20160930
  • Main IPC: G03F7/20
  • IPC: G03F7/20 H01L21/68
Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method
Abstract:
A liquid crystal exposure apparatus that moves a substrate supported in a noncontact manner by a noncontact holder to a projection optical system, and performs scanning exposure to the substrate equipped with: holding pads that hold a part of the substrate located at a first position above the noncontact holder; adsorption pads that hold another part of the substrate; a first drive section moves the holding pads from below the substrate direction intersecting a vertical direction, where the substrate is located at the first position held by the adsorption pads; and a second drive section that moves the adsorption pads holding the substrate, to a second position where the substrate is supported in a noncontact manner by the noncontact holder, wherein the scanning exposure, the second drive section moves the adsorption pads holding the substrate supported in a noncontact manner by the noncontact holder to the projection optical system.
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