Invention Grant
- Patent Title: Laser device
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Application No.: US16863277Application Date: 2020-04-30
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Publication No.: US11532921B2Publication Date: 2022-12-20
- Inventor: Hsin-Chan Chung , Shou-Lung Chen
- Applicant: EPISTAR CORPORATION , iReach Corporation
- Applicant Address: TW Hsinchu; TW Hsinchu
- Assignee: EPISTAR CORPORATION,iReach Corporation
- Current Assignee: EPISTAR CORPORATION,iReach Corporation
- Current Assignee Address: TW Hsinchu; TW Hsinchu
- Agency: Ditthavong, Steiner & Mlotkowski
- Priority: TW108115024 20190430
- Main IPC: H01S5/042
- IPC: H01S5/042 ; H01S5/028 ; H01S5/183 ; H01S5/023 ; H01S5/0225 ; H01S5/0233 ; H01S5/0235

Abstract:
A semiconductor device includes a substrate, an epitaxial stack disposed on the substrate, a first connection layer between the epitaxial stack and the substrate and a first electrode disposed on the first connection layer. The substrate has a first side surface and a second side surface. The epitaxial stack has a semiconductor structure with a first lateral surface adjacent to the first side surface and a second lateral surface opposing the first lateral surface and adjacent to the second side surface. The first connection layer has a first protruding portion extending beyond the first lateral surface and a second protruding portion extending beyond the second lateral surface. The first electrode is in contact with the first protruding portion and the second protruding portion.
Public/Granted literature
- US20200350742A1 LASER DEVICE Public/Granted day:2020-11-05
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