Invention Grant
- Patent Title: Methods of modelling systems or performing predictive maintenance of lithographic systems
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Application No.: US15760228Application Date: 2016-09-13
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Publication No.: US11543814B2Publication Date: 2023-01-03
- Inventor: David Evert Song Kook Sigtermans , René Fussenich , Adam Marek Kielczewski , Errol Arthur Zalmijn , Marcel Richard André Brunt , Stefan Lucian Voinea
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2016/071519 WO 20160913
- International Announcement: WO2017/055073 WO 20170406
- Main IPC: G05B23/02
- IPC: G05B23/02 ; G06F11/07 ; G03F7/20

Abstract:
Predictive maintenance methods and systems, including a method of applying transfer entropy techniques to find a causal link between parameters; a method of applying quality weighting to context data based on a priori knowledge of the accuracy of the context data; a method of detecting a maintenance action from parameter data by detecting a step and a process capability improvement; a method of managing unattended alerts by considering cost/benefit of attending to one or more alerts over time and assigning alert expiry time and/or ranking the alerts accordingly; a method of displaying components of a complex system in a functional way enabling improvements in system diagnostics; a method of determining the time of an event indicator in time series parameter data; a method of classifying an event associated with a fault condition occurring within a system; and a method of determining whether an event recorded in parameter data is attributable to an external factor.
Public/Granted literature
- US20180267523A1 METHODS OF MODELLING SYSTEMS OR PERFORMING PREDICTIVE MAINTENANCE OF LITHOGRAPHIC SYSTEMS Public/Granted day:2018-09-20
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