Invention Grant
- Patent Title: High frequency capacitor with inductance cancellation
-
Application No.: US16051376Application Date: 2018-07-31
-
Publication No.: US11552030B2Publication Date: 2023-01-10
- Inventor: Daniel Sira , Domagoj Siprak , Jonas Fritzin
- Applicant: INTEL CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: INTEL CORPORATION
- Current Assignee: INTEL CORPORATION
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L23/66 ; H01L49/02 ; H01L27/06 ; H01L23/482 ; G06F30/367

Abstract:
An integrated circuit structure includes a first metallization layer with first and second electrodes, each of which has electrode fingers. A second metallization layer may be included below the first metallization layer and include one or more electrodes with electrode fingers. The integrated circuit structure is configured to exhibit at least partial vertical inductance cancellation when the first electrode and second electrode are energized. The integrated circuit structure can be configured to also exhibit horizontal inductance cancellation between adjacent electrode fingers. Also disclosed is a simulation model that includes a capacitor model that models capacitance between electrode fingers having a finger length and includes at least one resistor-capacitor series circuit in which a resistance of the resistor increases with decreasing finger length for at least some values of the finger length.
Public/Granted literature
- US20200043874A1 HIGH FREQUENCY CAPACITOR WITH INDUCTANCE CANCELLATION Public/Granted day:2020-02-06
Information query
IPC分类: