Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16680183Application Date: 2019-11-11
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Publication No.: US11552217B2Publication Date: 2023-01-10
- Inventor: Meng-Yang Chen
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Ditthavong, Steiner & Mlotkowski
- Priority: TW108130803 20190828
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L33/30 ; H01L33/50 ; H01L33/36

Abstract:
A semiconductor device is provided, which includes a first semiconductor structure, a second semiconductor structure and a light-emitting structure. The light-emitting structure is located between the first semiconductor structure and the second semiconductor structure. The light-emitting structure includes a multiple quantum well structure. The multiple quantum well structure contains aluminum and includes a plurality of semiconductor stacks. Each of the semiconductor stacks is stacked by a well layer and a barrier layer. In each semiconductor stack, the well layer has a thickness larger than a thickness of the barrier layer.
Public/Granted literature
- US20200152830A1 SEMICONDUCTOR DEVICE Public/Granted day:2020-05-14
Information query
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