Invention Grant
- Patent Title: Corrosion resistant ground shield of processing chamber
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Application No.: US16212580Application Date: 2018-12-06
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Publication No.: US11562890B2Publication Date: 2023-01-24
- Inventor: Dmitry Lubomirsky , Xiao Ming He , Jennifer Y. Sun , Xiaowei Wu , Laksheswar Kalita , Soonam Park
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/458 ; C23C16/46
Abstract:
A substrate support assembly includes a ground shield and a heater that is surrounded by the ground shield. The ground shield includes a plate. In one embodiment, the ground shield is composed of a ceramic body and includes an electrically conductive layer, a first protective layer on the upper surface of the plate. In another embodiment, the ground shield is composed of an electrically conductive body and a first protective layer on the upper surface of the plate.
Public/Granted literature
- US20200185203A1 CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER Public/Granted day:2020-06-11
Information query
