Invention Grant
- Patent Title: Gallium nitride transistors with source and drain field plates and their methods of fabrication
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Application No.: US16651327Application Date: 2017-09-28
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Publication No.: US11575036B2Publication Date: 2023-02-07
- Inventor: Han Wui Then , Stephan Leuschner , Marko Radosavljevic , Sansaptak Dasgupta
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- International Application: PCT/US2017/054184 WO 20170928
- International Announcement: WO2019/066878 WO 20190404
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/778 ; H01L21/285 ; H01L21/765 ; H01L29/20 ; H01L29/205 ; H01L29/423 ; H01L29/66 ; H03F3/21 ; H03F3/45

Abstract:
Gallium nitride (GaN) transistors with source and drain field plates are described. In an example, a transistor includes a gallium nitride (GaN) layer above a substrate, a gate structure over the GaN layer, a source region on a first side of the gate structure, a drain region on a second side of the gate structure, the second side opposite the first side, a source field plate above the source region, and a drain field plate above the drain region.
Public/Granted literature
- US20200227545A1 GALLIUM NITRIDE TRANSISTORS WITH SOURCE AND DRAIN FIELD PLATES AND THEIR METHODS OF FABRICATION Public/Granted day:2020-07-16
Information query
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