Invention Grant
- Patent Title: Integration of III-N transistors and non-III-N transistors by semiconductor regrowth
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Application No.: US16283301Application Date: 2019-02-22
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Publication No.: US11581313B2Publication Date: 2023-02-14
- Inventor: Sansaptak Dasgupta , Johann Christian Rode , Han Wui Then , Marko Radosavljevic , Paul B. Fischer , Nidhi Nidhi , Rahul Ramaswamy , Sandrine Charue-Bakker , Walid M. Hafez
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Akona IP PC
- Main IPC: H01L27/092
- IPC: H01L27/092 ; H01L29/26 ; H01L21/8238 ; H01L21/8258 ; H01L29/267

Abstract:
Disclosed herein are IC structures, packages, and devices that include III-N transistors integrated on the same support structure as non-III-N transistors (e.g., Si-based transistors), using semiconductor regrowth. In one aspect, a non-III-N transistor may be integrated with an III-N transistor by depositing a III-N material, forming an opening in the III-N material, and epitaxially growing within the opening a semiconductor material other than the III-N material. Since the III-N material may serve as a foundation for forming III-N transistors, while the non-III-N material may serve as a foundation for forming non-III-N transistors, such an approach advantageously enables implementation of both types of transistors on a single support structure. Proposed integration may reduce costs and improve performance by enabling integrated digital logic solutions for III-N transistors and by reducing losses incurred when power is routed off chip in a multi-chip package.
Public/Granted literature
- US20200273860A1 INTEGRATION OF III-N TRANSISTORS AND NON-III-N TRANSISTORS BY SEMICONDUCTOR REGROWTH Public/Granted day:2020-08-27
Information query
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