Invention Grant
- Patent Title: Methods of modulating flow during vapor jet deposition of organic materials
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Application No.: US17082169Application Date: 2020-10-28
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Publication No.: US11591686B2Publication Date: 2023-02-28
- Inventor: Gregory McGraw , William E. Quinn , Matthew King , Elliot H. Hartford, Jr. , Siddharth Harikrishna Mohan , Benjamin Swedlove , Gregg Kottas
- Applicant: Universal Display Corporation
- Applicant Address: US NJ Ewing
- Assignee: Universal Display Corporation
- Current Assignee: Universal Display Corporation
- Current Assignee Address: US NJ Ewing
- Agency: Butzel Long
- Main IPC: C23C14/54
- IPC: C23C14/54 ; C23C14/12 ; C23C14/22 ; B41J2/045 ; C23C14/04 ; H01L51/56 ; H01L51/00 ; B05D1/00
Abstract:
Methods of modulating flow during vapor jet deposition of organic materials are provided. A method may include ejecting a vapor entrained in a delivery gas from a nozzle onto a substrate upon which the vapor condenses. A confinement gas may be provided that has a flow direction opposing a flow direction of the delivery gas ejected from the nozzle. A vacuum source may be provided that is adjacent to a delivery gas aperture of the nozzle. The method may include adjusting, by an actuator, a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target.
Public/Granted literature
- US20210054495A1 SYSTEMS AND METHODS OF MODULATING FLOW DURING VAPOR JET DEPOSITION OF ORGANIC MATERIALS Public/Granted day:2021-02-25
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