Invention Grant
- Patent Title: Responsible development process and definition of integration patterns and semantics
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Application No.: US17023823Application Date: 2020-09-17
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Publication No.: US11593250B2Publication Date: 2023-02-28
- Inventor: Daniel Ritter
- Applicant: SAP SE
- Applicant Address: DE Walldorf
- Assignee: SAP SE
- Current Assignee: SAP SE
- Current Assignee Address: DE Walldorf
- Agency: Buckley, Maschoff & Talwalkar LLC
- Main IPC: G06F11/36
- IPC: G06F11/36

Abstract:
According to some embodiments, methods and systems may be associated with enterprise application integration. A formalization platform may facilitate definition of Enterprise Integration Patterns (“EIP”) using a formal representation and defined execution semantics. The formalization platform may also execute model checking to find errors in the formal representation. An implementation platform may receive information from the correctness platform and translate the formal model generated by the correctness platform. The implementation platform may also configure implementation parameters of the translated formal model and simulate the EIP patterns to provide experimental validation. A correctness platform may receive information from the formalization platform and evaluate correctness of the EIP patterns defined via the formalization platform.
Public/Granted literature
- US20220083449A1 RESPONSIBLE DEVELOPMENT PROCESS AND DEFINITION OF INTEGRATION PATTERNS AND SEMANTICS Public/Granted day:2022-03-17
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