Invention Grant
- Patent Title: Method of manufacturing polyimide film
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Application No.: US17578688Application Date: 2022-01-19
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Publication No.: US11596065B2Publication Date: 2023-02-28
- Inventor: Yu Kyoung Choi , Jong Un Park
- Applicant: Yu Kyoung Choi
- Applicant Address: KR Yongin-si
- Assignee: Yu Kyoung Choi
- Current Assignee: Yu Kyoung Choi
- Current Assignee Address: KR Yongin-si
- Agency: Kile Park Reed & Houtteman PLLC
- Priority: KR10-2021-0016531 20210205
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K1/02 ; H05K1/11 ; B05D3/04 ; B05D1/12

Abstract:
Provided are a polyimide film capable of reducing a dielectric constant of a substrate and reducing a thickness and forming a stable via with a low possibility of disconnection, a method for manufacturing the same, and an FPCB including the same. A polyimide film according to an exemplary embodiment of the present invention includes a polyimide layer and a plurality of fluororesin particles dispersed in the polyimide layer. The fluororesin particles have a spherical or flat shape.
Public/Granted literature
- US20220256697A1 POLYIMIDE FILM, METHOD OF MANUFACTURING THE SAME, AND FLEXIBLE PRINTED CIRCUIT BOARD HAVING THE SAME Public/Granted day:2022-08-11
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