- Patent Title: Valve device, flow rate control method, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing apparatus using the valve device
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Application No.: US17425974Application Date: 2020-01-17
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Publication No.: US11598430B2Publication Date: 2023-03-07
- Inventor: Daihi Tsuchiguchi , Toshihide Yoshida , Ryutaro Tanno , Yuya Suzuki , Kenta Kondo , Tomohiro Nakata , Tsutomu Shinohara , Masahiko Takimoto
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JPJP2019-015592 20190131
- International Application: PCT/JP2020/001534 WO 20200117
- International Announcement: WO2020/158459 WO 20200806
- Main IPC: F16K7/16
- IPC: F16K7/16 ; F16K31/00 ; F16K31/122 ; F16K37/00 ; F16K31/02 ; F16K7/17 ; G05D7/06

Abstract:
A valve device capable of precisely adjusting a flow rate includes: an operating member for operating a diaphragm and provided movably between a closed position at which diaphragm closes a flow path and an open position at which diaphragm opens the flow path; a main actuator that receives pressure from a supplied drive fluid and moves the operating member to the open position or the closed position; an adjusting actuator for adjusting the position of the operating member positioned in the open position by using a passive element which expands and contracts in response to a given input signal; a position detecting mechanism for detecting the position of the operating member with respect to a valve body; and an origin position determining unit that uses a valve closed state in which the diaphragm contacts to valve seat to determine an origin position of the position detecting mechanism.
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