Invention Grant
- Patent Title: Sample pretreatment device
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Application No.: US16927283Application Date: 2020-07-13
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Publication No.: US11607701B2Publication Date: 2023-03-21
- Inventor: Kazuteru Takahashi , Kenta Terashima
- Applicant: SHIMADZU CORPORATION
- Applicant Address: JP Kyoto
- Assignee: SHIMADZU CORPORATION
- Current Assignee: SHIMADZU CORPORATION
- Current Assignee Address: JP Kyoto
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2019-166069 20190912
- Main IPC: B05B15/522
- IPC: B05B15/522 ; G01N1/31 ; B05B15/555 ; G01N35/10 ; H01J49/04 ; H01J49/16

Abstract:
Provided is a sample pretreatment device configured to apply, to the surface of a sample, a solution in which a predetermined substance is dissolved or dispersed. In order to properly and efficiently unclog a nozzle due to the deposition of the crystal of a matrix substance, the device includes a spray unit (3) including a solution tube (32) for the solution to pass through, a gas tube (33) for a spray gas to pass through, and a nozzle part (30) configured to spray the solution arriving at the terminal end of the solution tube by ejection of the spray gas through the gas tube, as well as a cleaning liquid supplier (4, 41) configured to put a cleaning liquid on an opening of the nozzle part from outside the spray unit.
Public/Granted literature
- US20210078030A1 SAMPLE PRETREATMENT DEVICE Public/Granted day:2021-03-18
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