Invention Grant
- Patent Title: Charged particle beam device
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Application No.: US17294468Application Date: 2018-12-06
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Publication No.: US11610754B2Publication Date: 2023-03-21
- Inventor: Katsura Takaguchi , Yohei Nakamura , Masahiro Sasajima , Toshihide Agemura , Natsuki Tsuno
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge, P.C.
- International Application: PCT/JP2018/044976 WO 20181206
- International Announcement: WO2020/115876 WO 20200611
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/244 ; H01J37/28

Abstract:
An object of the invention is to provide a charged particle beam device capable of specifying an irradiation position of light on a sample when there is no mechanism for forming an image of backscattered electrons. The charged particle beam device according to the invention determines whether an irradiation position of a primary charged particle beam and an irradiation position of light match based on a difference between a first observation image acquired when the sample is irradiated with only the primary charged particle beam and a second observation image acquired when sample is irradiated with the light in addition to the primary charged particle beam. It is determined whether the irradiation position of the primary charged particle beam and the irradiation position of the light match using the first observation image and a measurement result by a light amount measuring device.
Public/Granted literature
- US20220013326A1 CHARGED PARTICLE BEAM DEVICE Public/Granted day:2022-01-13
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