Invention Grant
- Patent Title: Methods, processes, and apparatus for depositing nanosensors on low surface energy substrates
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Application No.: US17327114Application Date: 2021-05-21
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Publication No.: US11619606B2Publication Date: 2023-04-04
- Inventor: Vijay Varadan , Pratyush Rai , Gyanesh Mathur
- Applicant: NANOWEAR INC.
- Applicant Address: US NY Brooklyn
- Assignee: NANOWEAR INC.
- Current Assignee: NANOWEAR INC.
- Current Assignee Address: US NY Brooklyn
- Agency: Davidson, Davidson & Kappel, LLC
- Main IPC: G01N27/416
- IPC: G01N27/416 ; G01N27/414 ; G01N27/12 ; G01N27/327 ; H05H1/38 ; B82Y15/00

Abstract:
A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
Public/Granted literature
- US20210278366A1 METHODS, PROCESSES, AND APPARATUS FOR DEPOSITING NANOSENSORS ON LOW SURFACE ENERGY SUBSTRATES Public/Granted day:2021-09-09
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