Invention Grant
- Patent Title: Position measurement system, interferometer system and lithographic apparatus
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Application No.: US16975745Application Date: 2019-03-01
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Publication No.: US11619886B2Publication Date: 2023-04-04
- Inventor: Johannes Mathias Theodorus Antonius Adriaens , Carolus Johannes Catharina Schoormans , Thomas Voβ
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP18165081 20180329
- International Application: PCT/EP2019/055131 WO 20190301
- International Announcement: WO2019/185298 WO 20191003
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B9/02015

Abstract:
A position measurement system including a first interferometer and a second interferometer arranged to determine a distance of the object in a first direction when the object is in a first measurement area by emitting beams onto a target surface of the object. The position measurement system further has a third interferometer and a fourth interferometer arranged to determine a distance of the object in the first direction when the object is in a second measurement area by emitting beams onto the target surface of the object. An arrangement of relative positions in a second direction of beams spots impinging on the target surface from the beams emitted by the first and second interferometers is different from an arrangement of relative positions in the second direction of beams spots impinging on the target surface from the beams emitted by the third and fourth interferometers.
Information query
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