Invention Grant
- Patent Title: Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
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Application No.: US16950899Application Date: 2020-11-17
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Publication No.: US11626316B2Publication Date: 2023-04-11
- Inventor: Mitsuya Utsuno , Yan Zhang , Yoshio Susa , Atsuki Fukazawa
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: H01L21/762
- IPC: H01L21/762 ; H01L21/02 ; H01L21/311 ; C23C16/26 ; C23C16/455 ; C23C16/50 ; C23C16/04 ; C23C16/56
Abstract:
Methods and systems for filling a recess on a surface of a substrate with carbon-containing material are disclosed. Exemplary methods include forming a first carbon layer within the recess, etching a portion of the first carbon layer within the recess, and forming a second carbon layer within the recess. Structures formed using the method or system are also disclosed.
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