Invention Grant
- Patent Title: Antenna gate field plate on 2DEG planar FET
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Application No.: US16218886Application Date: 2018-12-13
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Publication No.: US11626513B2Publication Date: 2023-04-11
- Inventor: Rahul Ramaswamy , Nidhi Nidhi , Walid M. Hafez , Johann C. Rode , Paul Fischer , Han Wui Then , Marko Radosavljevic , Sansaptak Dasgupta , Heli Chetanbhai Vora
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/778 ; H01L29/66 ; H01L29/423 ; H01L29/43 ; H01L21/285 ; H01L29/40 ; H01L21/02 ; H01L29/20

Abstract:
Embodiments include a transistor and methods of forming a transistor. In an embodiment, the transistor comprises a semiconductor channel, a source electrode on a first side of the semiconductor channel, a drain electrode on a second side of the semiconductor channel, a polarization layer over the semiconductor channel, an insulator stack over the polarization layer, and a gate electrode over the semiconductor channel. In an embodiment, the gate electrode comprises a main body that passes through the insulator stack and the polarization layer, and a first field plate extending out laterally from the main body.
Information query
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