Invention Grant
- Patent Title: Lithographic apparatus and method
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Application No.: US17698100Application Date: 2022-03-18
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Publication No.: US11630399B2Publication Date: 2023-04-18
- Inventor: Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
Public/Granted literature
- US20220206400A1 LITHOGRAPHIC APPARATUS AND METHOD Public/Granted day:2022-06-30
Information query
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