- Patent Title: Halogen resistant coatings and methods of making and using thereof
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Application No.: US16401467Application Date: 2019-05-02
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Publication No.: US11639547B2Publication Date: 2023-05-02
- Inventor: Prerna Goradia , Jennifer Y. Sun , Xiaowei Wu , Geetika Bajaj , Atul Chaudhari , Ankur Kadam
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Priority: ININ201841016725 20180503
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/455 ; H01J37/32 ; C23C16/18 ; C23C16/27 ; C23C16/40
Abstract:
Described herein are articles, systems and methods where a halogen resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The halogen resistant coating has an optional amorphous seed layer and a transition metal-containing layer. The halogen resistant coating uniformly covers features of the chamber component, such as those having an aspect ratio of about 3:1 to about 300:1.
Public/Granted literature
- US20190338418A1 HALOGEN RESISTANT COATINGS AND METHODS OF MAKING AND USING THEREOF Public/Granted day:2019-11-07
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