Invention Grant
- Patent Title: Analysis apparatus and analysis method
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Application No.: US17404769Application Date: 2021-08-17
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Publication No.: US11640903B2Publication Date: 2023-05-02
- Inventor: Jiahong Wu , Miki Takimoto
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2021-030586 20210226
- Main IPC: H01J49/04
- IPC: H01J49/04 ; H01J49/16 ; H01J49/10

Abstract:
An analysis apparatus includes a stage on which an analysis sample as an analysis target and a first adjustment sample used for adjusting a focus are provided. A laser generation unit generates a laser beam for vaporizing the analysis sample or the first adjustment sample by irradiating the sample with the laser beam. A detection unit detects a signal intensity of an element of the analysis sample or the first adjustment sample vaporized by irradiation with the laser beam. A controller determines a focus position of the laser beam with respect to a front surface position of the first adjustment sample based on the signal intensity of the first adjustment sample, and performs a control such that the focus position of the laser beam corresponds with a front surface of the analysis sample.
Public/Granted literature
- US20220277946A1 ANALYSIS APPARATUS AND ANALYSIS METHOD Public/Granted day:2022-09-01
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