Invention Grant
- Patent Title: Charged particle beam apparatus
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Application No.: US17545944Application Date: 2021-12-08
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Publication No.: US11646172B2Publication Date: 2023-05-09
- Inventor: Takafumi Miwa , Yohei Nakamura , Natsuki Tsuno , Heita Kimizuka , Muneyuki Fukuda
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge, P.C.
- Priority: JP 2019146175 2019.08.08
- Main IPC: H01J37/24
- IPC: H01J37/24 ; H01J37/244 ; H01J37/28

Abstract:
A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.
Public/Granted literature
- US20220102109A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2022-03-31
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