Invention Grant
- Patent Title: High absorption photovoltaic material and methods of making the same
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Application No.: US16951541Application Date: 2020-11-18
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Publication No.: US11658253B2Publication Date: 2023-05-23
- Inventor: Ping Kuang , Shawn Yu Lin , Anthony Post , Sajeev Oommen John , Sergey Leonidovich Eyderman , Mei-Li Hsieh
- Applicant: RENSSELAER POLYTECHNIC INSTITUTE
- Applicant Address: US NY Troy
- Assignee: Rensselaer Polytechnic Institute
- Current Assignee: Rensselaer Polytechnic Institute
- Current Assignee Address: US NY Troy
- Agency: Murtha Cullina LLP
- Agent Anthony P. Gangemi
- Main IPC: H01L31/0236
- IPC: H01L31/0236 ; H01L31/0216 ; H01L31/18

Abstract:
A high absorption photovoltaic material and method of making the material for use in a solar cell are disclosed. The photovoltaic material includes a surface modified with a layer of repeating photonic crystal structures. The photonic crystal structures are approximately inverse conically shaped and have a curved sidewall that has an approximately Gaussian shape. The photonic crystal structures generally have a high vertical depth and sidewall angle. The structures also have a gradient refractive index profile and exhibit the parallel-to-interface refraction light trapping effect. An anti-reflective coating is disposed over the photonic crystal structure layer. The photovoltaic material exhibits near unity light absorption over a broad range of visible and near infrared wavelengths and incidence angles, even at reduced thicknesses. The photovoltaic structures are formed via a combined photolithography and reactive-ion etching method at low power with a gas mixture having a high ratio of an etchant component to a passivation component.
Public/Granted literature
- US20210074867A1 HIGH ABSORPTION PHOTOVOLTAIC MATERIAL AND METHODS OF MAKING THE SAME Public/Granted day:2021-03-11
Information query
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